@inproceedings{inproceedings, title  = {{Inductively coupled plasma etching of GaN using SiCl<sub>4</sub>/Cl<sub>2</sub>/Ar for submicron‐sized features fabrication}},

 publisher = {{Wiley}},

 url = {{https://doi.org/10.1002/pssc.200674851 }},

 year = {{2007}},

 month = {{6}},

 author = {{Dylewicz R and Hogg RA and Fry PW and Parbrook PJ and Airey R and Tahraoui A and Patela S}},

 doi = {{10.1002/pssc.200674851}},

 volume = {{4}},

 journal = {{physica status solidi c}},

 issue = {{7}},

 pages = {{2634-2637}},

 note = {{Accessed on 2025/04/18}}}