TY  - JOUR

T1  - The impact of non-uniform channel layer growth on device characteristics in state of the Art Si/SiGe/Si p-metal oxide semiconductor field effect transistors

JO  - THIN SOLID FILMS

PY  - 2006/02/21

AU  - Chang ACK

AU  - Ross IM

AU  - Norris DJ

AU  - Cullis AG

AU  - Tang YT

AU  - Cerrina C

AU  - Evans AGR

ED  - 

DO  - DOI: 10.1016/j.tsf.2005.08.364

VL  - 496

IS  - 2

SP  - 306

EP  - 310

Y2  - 2025/04/02

ER  -